UV-Induced Synthesis of Hybrid HMDSO/SiO 2 Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance
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Published in | ACS applied materials & interfaces Vol. 15; no. 41; pp. 48810 - 48817 |
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Main Authors | , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
18.10.2023
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Online Access | Get full text |
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ISSN: | 1944-8244 1944-8252 |
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DOI: | 10.1021/acsami.3c10434 |