Boosting Electrochemical Ammonia Synthesis via NO x Reduction over Sulfur‐Doped Copper Oxide Nanoneedle Arrays
The electrochemical NO x reduction reactions, involving nitrate and nitrite reduction reactions (NO 3 − RR and NO 2 − RR), have emerged as promising approaches for both NO 3 − and NO 2 − removal, and ammonium (NH 3 ) synthesis under ambient conditions. However, the incorporation and stabilization of...
Saved in:
Published in | Advanced energy materials Vol. 14; no. 30 |
---|---|
Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.08.2024
|
Online Access | Get full text |
Cover
Loading…
Summary: | The electrochemical NO
x
reduction reactions, involving nitrate and nitrite reduction reactions (NO
3
−
RR and NO
2
−
RR), have emerged as promising approaches for both NO
3
−
and NO
2
−
removal, and ammonium (NH
3
) synthesis under ambient conditions. However, the incorporation and stabilization of sulfur dopants in the catalysts for efficient NO
x
reduction are rarely explored, leading to an unclear effect of sulfur on the NO
x
reduction mechanism. Herein, sulfur‐doped Cu
2
O (S‐Cu
2
O) nanoneedle arrays via in situ electrochemical treatment are synthesized. The S‐Cu
2
O catalyst possesses excellent durability and selectivity for NH
3
over a wide range of potentials in NO
3
−
RR, attaining a maximum NH
3
Faradaic efficiency of 94% at −0.6 V
RHE
and a maximum NH
3
yield as high as 1.06 mmol h
−1
cm
−2
. In NO
3
−
RR, the sulfur dopant can accelerate the step from NO
2
−
to NH
3
, contributing superior performance in NO
2
−
RR and assembled Zn−NO
2
−
battery device. Density functional theory (DFT) calculations reveal that the presence of sulfur can enhance the initial step of *NO
3
adsorption, lower the reaction barriers for the formation of *NHO intermediate, and activate the H
2
O dissociation process. The work sheds light on the role of sulfur in enhancing electrocatalytic performance and provides a unique perspective for understanding the NO
x
reduction mechanism. |
---|---|
ISSN: | 1614-6832 1614-6840 |
DOI: | 10.1002/aenm.202400790 |