不同进液方式下铜电解槽内电解液流动特性的评价

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Published in中国有色金属学报：英文版 Vol. 27; no. 10; pp. 2282 - 2290
Main Author 周萍;马海博;谢紫微;闫红杰;Chenn Q. ZHOU
Format Journal Article
LanguageEnglish
Published 2017
Subjects
铜电解精炼;进液口布置方式;流场均匀性;计算流体力学
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Bibliography:The arrangement of electrolyte inlet in the copper electro-refining(ER)cell has a great influence on the local flow field,which affects the distribution of electrical current density in consequence.In order to understand the complicated phenomena ofelectrolyte flow behavior in vertical counter electrodes in full-scale copper ER cell,the three-dimensional computational fluiddynamics(CFD)models with four different arrangements of electrolyte inlets,i.e.,single inlet(SI),central bottom inlets(CBI),topside interlaced inlets(TII),and bottom side interlaced inlets(BII),were established to simulate the flow behavior.Simulation resultshave revealed that the parallel injection devices help to improve the electrolyte velocity between electrodes,and while the relativerange of electrolyte velocity in CBI exceeds that of TII and BII,which is more than4times,indicating its severer unequal flowdistribution.Meanwhile,the average velocity of electrolyte in BII is4times larger than that of SI due to its higher turbulenceintensity.Generally,one of the efficient ways to supply fresh copper solution rapidly and uniformly into the inter-electrode space is toadapt the arrangement of BII.By utilizing such an arrangement,the electro-refining under high electrical current density is possible,and the productivity can be increased in sequence.
43-1239/TG
copper electro-refining; electrolyte inlet arrangement; flow uniformity; computational fluid dynamics
ISSN:1003-6326