图形双缓冲和GDI+在多靶磁控溅射系统中的应用

根据双缓冲的原理,利用GDI+中高级图形处理功能较高地还原磁控溅射工艺的全流程,以动画的形式实时呈现在UI界面上的全过程。双缓冲的实现使得用户在观察窗狭小的情况下,通过软件UI界面能实时浏览工艺的当前运行进度。

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Bibliographic Details
Published in电子工业专用设备 no. 4; pp. 50 - 55
Main Author 陈立宁 罗超 林伯奇 彭栋
Format Journal Article
LanguageChinese
Published 2017
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Summary:根据双缓冲的原理,利用GDI+中高级图形处理功能较高地还原磁控溅射工艺的全流程,以动画的形式实时呈现在UI界面上的全过程。双缓冲的实现使得用户在观察窗狭小的情况下,通过软件UI界面能实时浏览工艺的当前运行进度。
Bibliography:It describes how to use the senior functions in GDI plus and animate the magnet sputtering process on UI in this dissertation. The application of double buffer in the system makes users have a real time view about the magnet sputtering process on top of the software UI without taking a bad look at the inside by a small window.
Chen Li-ning, Luo Chao, Lin Bo-qi, Peng Dong (The 48th Research Institute of CETC, Changsha, 410111)
62-1077/TN
Double buffer; Flashing; GDI+ (Graphic Device Interface)
ISSN:1004-4507