Relationship between bias voltage and microstructure as well as properties of CrAIYN films

In this work, a series of CrA1YN films doped with 1 at.% yttrium were deposited by unbalanced reactive magnetron sputtering under different bias voltages, The effects of bias voltage on microstrncture and properties of the CrA1YN films were subsequently investigated. It is found that all the as-depo...

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Published in中国物理B:英文版 no. 11; pp. 342 - 351
Main Author 付英英 李红轩 吉利 刘晓红 刘流 周惠娣 陈建敏
Format Journal Article
LanguageEnglish
Published 2015
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Summary:In this work, a series of CrA1YN films doped with 1 at.% yttrium were deposited by unbalanced reactive magnetron sputtering under different bias voltages, The effects of bias voltage on microstrncture and properties of the CrA1YN films were subsequently investigated. It is found that all the as-deposited films have similar chemical composition and crystalline structure. However, the bias voltage has significant impact on the mechanical properties and oxidation resistance of the resulting films. Namely, the film deposited at 100 V has the highest hardness and best oxidation resistance, which are mainly attributed to its denser structure and higher A1 content than others. In addition, the film obtained at 100 V exhibits superior oxidation resistance even at 1000℃, and good friction and wear properties at 600 and 800 ℃, and the latter two are mainly ascribed to the formation of compact transfer layer on the worn surfaces. However, this film experienced obvious wear loss at low testing temperatures (i.e., 200 and 400 ℃) due to the serious abrasive wear.
Bibliography:11-5639/O4
CrAlYN film, bias voltage, microstructure, properties
In this work, a series of CrA1YN films doped with 1 at.% yttrium were deposited by unbalanced reactive magnetron sputtering under different bias voltages, The effects of bias voltage on microstrncture and properties of the CrA1YN films were subsequently investigated. It is found that all the as-deposited films have similar chemical composition and crystalline structure. However, the bias voltage has significant impact on the mechanical properties and oxidation resistance of the resulting films. Namely, the film deposited at 100 V has the highest hardness and best oxidation resistance, which are mainly attributed to its denser structure and higher A1 content than others. In addition, the film obtained at 100 V exhibits superior oxidation resistance even at 1000℃, and good friction and wear properties at 600 and 800 ℃, and the latter two are mainly ascribed to the formation of compact transfer layer on the worn surfaces. However, this film experienced obvious wear loss at low testing temperatures (i.e., 200 and 400 ℃) due to the serious abrasive wear.
ISSN:1674-1056
2058-3834