Design and implementation of 83-nm low noise InP-based InAIAs/InGaAs PHEMTs

83-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors (PHEMTs) with excellent DC and RF performance as well as low noise characteristics are reported, including a maximum saturation current density/ass of 894 mA/mm, a maximum extrinsic transcond...

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Bibliographic Details
Published in半导体学报:英文版 no. 8; pp. 83 - 87
Main Author 王志明 赵卓彬 胡志富 黄辉 崔玉兴 孙希国 默江辉 李亮 付兴昌 吕昕
Format Journal Article
LanguageEnglish
Published 2015
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