Design and implementation of 83-nm low noise InP-based InAIAs/InGaAs PHEMTs
83-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors (PHEMTs) with excellent DC and RF performance as well as low noise characteristics are reported, including a maximum saturation current density/ass of 894 mA/mm, a maximum extrinsic transcond...
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Published in | 半导体学报:英文版 no. 8; pp. 83 - 87 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
2015
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Subjects | |
Online Access | Get full text |
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