5-甲基苯并三氮唑作为电腐蚀抑制剂在铜电化学机械平坦化中的应用
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| Published in | 中国有色金属学报：英文版 no. 8; pp. 2431 - 2438 |
|---|---|
| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
2013
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| Subjects | |
| Online Access | Get full text |
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| Author | 边燕飞 翟文杰 朱宝全 |
|---|---|
| AuthorAffiliation | 哈尔滨工业大学机电工程学院,哈尔滨150001 |
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| DocumentTitleAlternate | 5-methyl-1H-benzotriazole as potential corrosion inhibitor for electrochemical-mechanical planarization of copper |
| EndPage | 2438 |
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| Notes | According to the electrochemical analysis, the corrosion inhibition efficiency of 5-methyl-lH-benzotriazole （m-BTA） is higher than that of benzotrizaole （BTA）. The inhibition capability of the m-BTA passive film formed in hydroxyethylidenediphosphonic acid （HEDP） electrolyte containing both m-BTA and chloride ions is superior to that formed in m-BTA-alone electrolyte, even at a high anodic potential. The results of electrical impedance spectroscopy, nano-scratch experiments and energy dispersive analysis of X-ray （EDAX） indicate that the enhancement of m-BTA inhibition capability may be due to the increasing thickness of passive film. Furthermore, X-ray photoelectron spectrometry （XPS） analysis indicates that the increase in passive film thickness can be attributed to the incorporation of C1 into the m-BTA passive film and the formation of [Cu（I）CI（rn-BTA）], polymer film on Cu surface. Therefore, the introduction of C1- into m-BTA-containing HEDP electrolyte is effective to enhance the passivation capability of m-BTA passive film, thus extending the operating potential window. 43-1239/TG electrochemical-mechanical planarization; 5-methyl-lH-benzotriazole; corrosion inhibitor; chloride ion Yan-fei BIAN, Wen-jie ZHAI, Bao-quan ZHU School of Mechatronics Engineering, Harbin Institute of Technology, Harbin l 50001, China |
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| PublicationDate | 2013 |
| PublicationDateYYYYMMDD | 2013-01-01 |
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| PublicationTitle | 中国有色金属学报：英文版 |
| PublicationTitleAlternate | Transactions of Nonferrous Metals Society of China |
| PublicationYear | 2013 |
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| StartPage | 2431 |
| SubjectTerms | 5-methyl-1H—benzotriazole 氯离子 电化学机械平坦化 腐蚀抑制剂 |
| Title | 5-甲基苯并三氮唑作为电腐蚀抑制剂在铜电化学机械平坦化中的应用 |
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