Exploring Intrinsic and Extrinsic $p$-type Dopability of Atomically Thin $\beta$-TeO$_2$ from First Principles
Two-dimensional (2D) $\beta$-TeO$_2$ has gained attention as a promising material for optoelectronic and power device applications, thanks to its transparency and high hole mobility. However, the underlying mechanism behind its $p$-type conductivity and dopability remains unclear. In this study, we...
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Main Authors | , , , |
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Format | Journal Article |
Language | English |
Published |
17.10.2024
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Subjects | |
Online Access | Get full text |
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Summary: | Two-dimensional (2D) $\beta$-TeO$_2$ has gained attention as a promising
material for optoelectronic and power device applications, thanks to its
transparency and high hole mobility. However, the underlying mechanism behind
its $p$-type conductivity and dopability remains unclear. In this study, we
investigate the intrinsic and extrinsic point defects in monolayer and bilayer
$\beta$-TeO$_2$, the latter of which has been experimentally synthesized, using
the HSE+D3 hybrid functional. Our results reveal that most intrinsic defects
are unlikely to contribute to $p$-type doping in 2D $\beta$-TeO$_2$. Moreover,
Si contamination could further impair $p$-type conductivity. Since the point
defects do not contribute to $p$-type conductivity, we propose two possible
mechanisms for hole conduction: hopping conduction via localized impurity
states, and substrate effects. We also explored substitutional $p$-type doping
in 2D $\beta$-TeO$_2$ with 10 trivalent elements. Among these, the Bi dopant is
found to exhibit a relatively shallow acceptor transition level. However, most
dopants tend to introduce deep localized states, where hole polarons become
trapped at Te's lone pairs. Interestingly, monolayer $\beta$-TeO$_2$ shows
potential advantages over bilayers due to reduced self-compensation effects for
$p$-type dopants. These findings provide valuable insights into defect
engineering strategies for future electronic applications involving 2D
$\beta$-TeO$_2$. |
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DOI: | 10.48550/arxiv.2410.14100 |