Functionalized carbophenes as high-capacity versatile gas adsorbents: An ab initio study
Computational Materials Science 232 (2024) 112665 This study employs density functional theory (DFT) and density functional tight-binding theory (DFTB) to determine the adsorption properties of carbon dioxide (CO$_2$), methane (CH$_4$), and dihydrogen (H$_2$) in carbophenes functionalized with carbo...
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Main Authors | , , , , , , , , , |
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Format | Journal Article |
Language | English |
Published |
29.11.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Computational Materials Science 232 (2024) 112665 This study employs density functional theory (DFT) and density functional
tight-binding theory (DFTB) to determine the adsorption properties of carbon
dioxide (CO$_2$), methane (CH$_4$), and dihydrogen (H$_2$) in carbophenes
functionalized with carboxyl (COOH), amine (NH$_2$), nitro (NO$_2$), and
hydroxyl (OH) groups. We demonstrate that carbophenes are promising candidates
as adsorbents for these gasses. Carbophenes have larger CO$_2$ and CH$_4$
adsorption energies than other next-generation solid-state capture materials.
Yet, the low predicted desorption temperatures mean they can be beneficial as
air scrubbers in confined spaces. Functionalized carbophenes have H$_2$
adsorption energies usually observed in metal-containing materials. Further,
the predicted desorption temperatures of H$_2$ from carbophenes lie within the
DOE Technical Targets for Onboard Hydrogen Storage for Light-Duty Vehicles
(DOEHST) operating temperature range. The possibility of tailoring the degree
of functionalization in combination with selecting sufficiently open carbophene
structures that allow for multiple strong interactions without steric hindrance
(crowding) effects, added to the multiplicity of possible functional groups
alone or in combination, suggests that these very light materials can be ideal
adsorbates for many gases. Tailoring the design to specific adsorption or
separation needs would require extensive combinatorial investigations. |
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DOI: | 10.48550/arxiv.2311.17420 |