Temperature‐Dependent Phase Transition in WS2 for Reinforcing Band‐to‐Band Tunneling and Photoreactive Random Access Memory Application

Negative Differential Resistance Devices In article number 2300202, Taesung Kim and co‐workers present outstanding improvement in tunneling performance and achieve clear photoreactive NDR behavior via temperature‐based phase modification of TMD material. By using a metal layer sulfidation method, di...

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Bibliographic Details
Published inSmall science Vol. 4; no. 2
Main Authors Woo, Gunhoo, Cho, Jinill, Yeom, Heejung, Yoon, Min Young, Eom, Geon Woong, Kim, Muyoung, Mun, Jihun, Lee, Hyo Chang, Kim, Hyeong-U, Yoo, Hocheon, Kim, Taesung
Format Journal Article
LanguageEnglish
Published 01.02.2024
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