Temperature‐Dependent Phase Transition in WS2 for Reinforcing Band‐to‐Band Tunneling and Photoreactive Random Access Memory Application
Negative Differential Resistance Devices In article number 2300202, Taesung Kim and co‐workers present outstanding improvement in tunneling performance and achieve clear photoreactive NDR behavior via temperature‐based phase modification of TMD material. By using a metal layer sulfidation method, di...
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Published in | Small science Vol. 4; no. 2 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.02.2024
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Online Access | Get full text |
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