Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

The optimization problem of reducing EUV line edge roughness (LER) of a given feature, subject to the tolerance constraints on a CD of this feature at nominal EUV process conditions and several off-nominal conditions, is formulated. A stochastic rigorous Monte-Carlo EUV resist model is employed to s...

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Main Authors Biafore, John J, Latypov, Azat, Chunder, Anindarupa, Brendler, Andy, Bailey, Todd, Levinson, Harry J
Format Conference Proceeding
LanguageEnglish
Published SPIE 24.03.2017
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ISBN9781510607378
1510607374
ISSN0277-786X
DOI10.1117/12.2258707

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Summary:The optimization problem of reducing EUV line edge roughness (LER) of a given feature, subject to the tolerance constraints on a CD of this feature at nominal EUV process conditions and several off-nominal conditions, is formulated. A stochastic rigorous Monte-Carlo EUV resist model is employed to solve this stochastic optimization problem. Several options for optimization algorithms, suitable for the solution of the formulated EUV LER optimization problem, are presented and discussed, along with the results of their tests.
Bibliography:Conference Date: 2017-02-26|2017-03-02
Conference Location: San Jose, California, United States
ISBN:9781510607378
1510607374
ISSN:0277-786X
DOI:10.1117/12.2258707