Carbon nanopillar array deposition on SiO2 by ion irradiation through a porous alumina template

A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO2/Si substrate. Samples were irradiated by 4 MeV Cl2+ ions...

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Bibliographic Details
Published inVacuum Vol. 82; no. 3; p. 359
Main Authors Skupinski, Marek, Johansson, Anders, Jarmar, Tobias, Razpet, Alenka, Hjort, Klas, Boman, Mats, Possnert, Göran, Jensen, Jens
Format Journal Article
LanguageEnglish
Published 19.11.2007
Subjects
Anodic porous alumina membrane
Carbon nanostructures
Carbon pillars
Chemistry
Elementarpartikelfysik
Elementary particle physics
Fysik
Inorganic chemistry
Ion irradiation
Ion lithography
Ion physics
Jonfysik
Kemi
NATURAL SCIENCES
NATURVETENSKAP
Oorganisk kemi
Physics
SiO2
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Summary:A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO2/Si substrate. Samples were irradiated by 4 MeV Cl2+ ions with fluences of . The combined use of pick’n place positioning of the small porous alumina templates and ion beam irradiation is well suited for post-processing on silicon based integrated circuits. It provides fast local deposition at low temperature of high-density ordered carbon nanopillar arrays in larger silicon based systems, e.g., for field emitting or biosensors applications.
ISSN:1879-2715
0042-207X
DOI:10.1016/j.vacuum.2007.05.002