Nanoimprint lithography using novel optical materials for AR|MR devices

• Main Authors: Shimatani, Satoshi, Deshpande, Shree, Sato, Azumi, Liao, Yueh-Chen, Chisaka, Hiro, Konno, Kenri, Shida, Masaru
• Format: Conference Proceeding
• Language: English
• Published: SPIE 09.04.2024
• ISBN: 1510672206; 9781510672208
• ISSN: 0277-786X
• DOI: 10.1117/12.3012982

With the advent of novel optical and photonic devices such as Augmented Reality (AR), and Mixed Reality (MR), there is renewed interest in Nanoimprint Lithography (NIL) technology as a cost-effective approach to manufacture key performance enhancing components for these devices, such as surface relief gratings (SRGs) for waveguides. We have developed multiple types of resists for use in NIL for making Surface Relief Gratings (SRGs) for waveguides for AR and MR devices. This paper will discuss the NIL performance of our resists such as high refractive index functional NIL resists, resists for NIL-Etch process as we11 as resists for Bi-layer NIL-Etch approach for patterning high aspect ratio structures. We wi11 discuss various material properties and performance of the NIL resists in NIL process.