Thermodynamics of the formation of TiN from TiCl4-NH3-H2 on a patterned oxidized silicon substrate
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| Published in | Journal of the Electrochemical Society Vol. 143; no. 10; pp. 3251 - 3256 |
|---|---|
| Main Authors | , , |
| Format | Journal Article |
| Language | English |
| Published |
Pennington, NJ
Electrochemical Society
1996
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| Subjects | |
| Online Access | Get full text |
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| Author | IMHOFF, L REMY, J. C BOUTEVILLE, A |
|---|---|
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| Keywords | Temperature dependence Patterning Inorganic compounds Transition element compounds Theoretical study Binary compounds Experimental study Substrates Titanium nitrides Thin films Pressure dependence CVD Thermodynamic analysis |
| Language | English |
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| SubjectTerms | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Methods of deposition of films and coatings; film growth and epitaxy Physics |
| Title | Thermodynamics of the formation of TiN from TiCl4-NH3-H2 on a patterned oxidized silicon substrate |
| Volume | 143 |
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