Release layers for contact and imprint lithography

As new nanolithography technologies continue to be developed, their potential as cost-effective alternatives to optical lithography methods continues to grow. Low surface energy release layers comprised of amorphous fluoropolymers have already been proven to be effective for improving defect levels...

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Bibliographic Details
Published inSemiconductor International Vol. 25; no. 6; p. 71
Main Authors Resnick, Douglas J, Mancini, David P, Sreenivasan, S V, C Grant Willson
Format Trade Publication Article
LanguageEnglish
Published Newton Reed Business Information, a division of Reed Elsevier, Inc 01.06.2002
Subjects
Defects
Energy
Nanotechnology
Offset printing
Printing
Semiconductors
Technological change
United States > US
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Summary:As new nanolithography technologies continue to be developed, their potential as cost-effective alternatives to optical lithography methods continues to grow. Low surface energy release layers comprised of amorphous fluoropolymers have already been proven to be effective for improving defect levels in contact print lithography. It is unclear at this early stage of development whether nano imprint lithographies will supplant more established optical methodologies. However, it is clear that a successful release layer technology is required to control defects and enable the potential of imprint lithography to be achieved.
ISSN:0163-3767