Mechanical stress induced polarization reorientation in polycrystalline Bi(3.25)La(0.75)Ti(3)O(12) films

A wafer bending stage and a scanning probe microscope are combined to investigate the in situ domain pattern evolution in polycrystalline Bi(3.25)La(0.75)Ti(3)O(12) films under stress. We observe the stress induced polarization reorientation that sensitively depends on the relative alignment of the...

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Published inPhysics letters. A Vol. 374; no. 2; pp. 360 - 365
Main Authors Kan, Yi, Liu, Yunfei, Mieth, Oliver, Bo, Huifeng, Wu, Xiumei, Lu, Xiaomei, Eng, Lukas M, Zhu, Jinsong
Format Journal Article
LanguageEnglish
Published 28.12.2009
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Summary:A wafer bending stage and a scanning probe microscope are combined to investigate the in situ domain pattern evolution in polycrystalline Bi(3.25)La(0.75)Ti(3)O(12) films under stress. We observe the stress induced polarization reorientation that sensitively depends on the relative alignment of the BLT unit cell with respect to the stress.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0375-9601
DOI:10.1016/j.physleta.2009.10.084