Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition

• Published in: Water science and technology Vol. 60; no. 10; pp. 2471 - 2475
• Main Authors: Vilhunen, S H, Sillanpää, M E T
• Format: Journal Article
• Language: English
• Published: England 2009
• Subjects: Catalysis; Hydrogen-Ion Concentration; Nitrogen - chemistry; Photochemical Processes; Salicylic Acid - chemistry; Titanium - chemistry; Ultraviolet Rays; Water Pollutants, Chemical - chemistry; Water Purification
• ISSN: 0273-1223
• DOI: 10.2166/wst.2009.660

Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO(2)) and nitrogen-doped TiO(2) (TiO(2-x)-N(x)) combined with ultraviolet (UV) radiation was studied. TiO(2) film with thickness of 15 and 65 nm was tested. The TiO(2-x)-N(x) film had thickness of 15 nm on top of TiO(2) (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.