Stabilization of Cu+ via Strong Electronic Interaction for Selective and Stable CO2 Electroreduction

Copper oxide‐based materials effectively electrocatalyze carbon dioxide reduction (CO2RR). To comprehend their role and achieve high CO2RR activity, Cu+ in copper oxides must be stabilized. As an electrocatalyst, Cu2O nanoparticles were decorated with hexagonal boron nitride (h‐BN) nanosheets to sta...

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Published inAngewandte Chemie International Edition Vol. 61; no. 31; pp. e202205832 - n/a
Main Authors Zhou, Yixiang, Yao, Yebo, Zhao, Rui, Wang, Xiaoxuan, Fu, Zhenzhen, Wang, Dewei, Wang, Huaizhi, Zhao, Liang, Ni, Wei, Yang, Zhiyu, Yan, Yi‐Ming
Format Journal Article
LanguageEnglish
Published Germany Wiley Subscription Services, Inc 01.08.2022
EditionInternational ed. in English
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Summary:Copper oxide‐based materials effectively electrocatalyze carbon dioxide reduction (CO2RR). To comprehend their role and achieve high CO2RR activity, Cu+ in copper oxides must be stabilized. As an electrocatalyst, Cu2O nanoparticles were decorated with hexagonal boron nitride (h‐BN) nanosheets to stabilize Cu+. The C2H4/CO ratio increased 1.62‐fold in the CO2RR with Cu2O−BN compared to that with Cu2O. Experimental and theoretical studies confirmed strong electronic interactions between the two components in Cu2O−BN, which strengthens the Cu−O bonds. Electrophilic h‐BN receives partial electron density from Cu2O, protecting the Cu−O bonds from electron attack during the CO2RR and stabilizing the Cu+ species during long‐term electrolysis. The well‐retained Cu+ species enhanced the C2 product selectivity and improved the stability of Cu2O−BN. This work offers new insight into the metal‐valence‐state‐dependent selectivity of catalysts, enabling the design of advanced catalysts. Strong electronic interactions between hexagonal boron nitride (h‐BN) and Cu2O protect the Cu−O bonds against electron attack through the transfer of accumulated electrons from Cu2O to h‐BN. This effect stabilizes the active Cu+ species during CO2 electroreduction.
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ISSN:1433-7851
1521-3773
1521-3773
DOI:10.1002/anie.202205832