APA (7th ed.) Citation

Králik, M., Jurečka, S., & Pinčík, E. (2019). Determination of thickness of electrochemically etched Si layers passivated by Si3N4 by analysis of the experimental spectral reflectance. AIP conference proceedings, 2131(1), . https://doi.org/10.1063/1.5119478

Chicago Style (17th ed.) Citation

Králik, Martin, Stanislav Jurečka, and Emil Pinčík. "Determination of Thickness of Electrochemically Etched Si Layers Passivated by Si3N4 by Analysis of the Experimental Spectral Reflectance." AIP Conference Proceedings 2131, no. 1 (2019). https://doi.org/10.1063/1.5119478.

MLA (9th ed.) Citation

Králik, Martin, et al. "Determination of Thickness of Electrochemically Etched Si Layers Passivated by Si3N4 by Analysis of the Experimental Spectral Reflectance." AIP Conference Proceedings, vol. 2131, no. 1, 2019, https://doi.org/10.1063/1.5119478.