Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods

The refractive-index contrast in dielectric multilayer structures, optical resonators, and photonic crystals is an important figure of merit that creates a strong demand for high-quality thin films with a low refractive index. A SiO2 nanorod layer with low refractive index of n = 1.08, to our knowle...

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Published inOptics letters Vol. 31; no. 5; p. 601
Main Authors Xi, J Q, Kim, Jong Kyu, Schubert, E E, Ye, Dexian, Lu, T M, Lin, Shawn-Yu, Juneja, Jasbir S
Format Journal Article
LanguageEnglish
Published United States 01.03.2006
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Summary:The refractive-index contrast in dielectric multilayer structures, optical resonators, and photonic crystals is an important figure of merit that creates a strong demand for high-quality thin films with a low refractive index. A SiO2 nanorod layer with low refractive index of n = 1.08, to our knowledge the lowest ever reported in thin-film materials, is grown by oblique-angle electron-beam deposition of SiO2. A single-pair distributed Bragg reflector employing a SiO2 nanorod layer is demonstrated to have enhanced reflectivity, showing the great potential of low-refractive-index films for applications in photonic structures and devices.
ISSN:0146-9592
DOI:10.1364/OL.31.000601