The influence of implanted yttrium on the mechanism of growth of Cr2O3 on Cr

• Published in: Journal of the Electrochemical Society Vol. 134; no. 7; pp. 1871 - 1872
• Main Authors: COTELL, C. M, YUREK, G. J, HUSSEY, R. J, MITCHELL, D. F, GRAHAM, M. J
• Format: Journal Article
• Language: English
• Published: Pennington, NJ Electrochemical Society 01.07.1987
• Subjects: Applied sciences; Corrosion; Corrosion mechanisms; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Metals, semimetals and alloys; Metals. Metallurgy; Physics; Specific materials; Ion implantation; Growth; Oxide layer; Surface layer; Surface film; Radioactive tracers; Experimental study; Mechanism; Chromium oxide; Morphology; Oxidation; Diffusion; Yttrium; Concentration distribution

One of the apparent effects of Y on the growth of Cr2O3 scales, based on inert marker studies, is a change in growth mechanism from predominant cation diffusion to predominant anion diffusion (1-3). The interpretation of inert marker studies has always been open to question, and a recent study of th...