Heteroepitaxial van der Waals semiconductor superlattices
A broad range of transition metal dichalcogenide (TMDC) semiconductors are available as monolayer (ML) crystals, so the precise integration of each kind into van der Waals (vdW) superlattices (SLs) could enable the realization of novel structures with previously unexplored functionalities. Here we r...
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Published in | Nature nanotechnology Vol. 16; no. 10; pp. 1092 - 1098 |
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Main Authors | , , , , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
London
Nature Publishing Group UK
01.10.2021
Nature Publishing Group |
Subjects | |
Online Access | Get full text |
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Summary: | A broad range of transition metal dichalcogenide (TMDC) semiconductors are available as monolayer (ML) crystals, so the precise integration of each kind into van der Waals (vdW) superlattices (SLs) could enable the realization of novel structures with previously unexplored functionalities. Here we report the atomic layer-by-layer epitaxial growth of vdW SLs with programmable stacking periodicities, composed of more than two kinds of dissimilar TMDC MLs, such as MoS
2
, WS
2
and WSe
2
. Using kinetics-controlled vdW epitaxy in the near-equilibrium limit by metal–organic chemical vapour depositions, we achieved precise ML-by-ML stacking, free of interlayer atomic mixing, which resulted in tunable two-dimensional vdW electronic systems. As an example, by exploiting the series of type II band alignments at coherent two-dimensional vdW heterointerfaces, we demonstrated valley-polarized carrier excitations—one of the most distinctive electronic features in vdW ML semiconductors—which scale with the stack numbers
n
in our (MoS
2
/WS
2
)
n
SLs on optical excitations.
Kinetics-controlled van der Waals epitaxy in the near-equilibrium limit by metal–organic chemical vapour deposition enables precise layer-by-layer stacking of dissimilar transition metal dichalcogenides. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 content type line 23 |
ISSN: | 1748-3387 1748-3395 1748-3395 |
DOI: | 10.1038/s41565-021-00942-z |