Epitaxy of Strained Si/Si1-x Gex Heterostructures

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Bibliographic Details
Published inSilicon Technologies pp. 209 - 331
Main Author Hartmann, Jean‐Michel
Format Book Chapter
LanguageEnglish
Published United States Wiley 2013
John Wiley & Sons, Inc
Subjects
epitaxy
GexHeterostructures
nMOS
pMOS
reduced pressure‐chemical vapor deposition (RPCVD)
Si/SiGe (C)
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ISBN:1848212313
9781848212312
DOI:10.1002/9781118601044.ch4