Mogul‐Patterned Elastomeric Substrate for Stretchable Electronics
A mogul‐patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul‐patterned poly(dimethylsiloxane) substrate...
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| Published in | Advanced materials (Weinheim) Vol. 28; no. 16; pp. 3069 - 3077 |
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| Main Authors | , , , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Germany
27.04.2016
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| Subjects | |
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| Abstract | A mogul‐patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul‐patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul‐patterned stretchable substrate shows great promise for stretchable electronics. |
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| AbstractList | A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul-patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul-patterned stretchable substrate shows great promise for stretchable electronics. |
| Author | Sohn, Il‐Yung Duy, Le Thai Lee, Han‐Byeol Song, You‐Joon Kim, Do‐Il Kim, Youn‐Jea Bae, Chan‐Wool Lee, Nae‐Eung |
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| BackLink | https://www.ncbi.nlm.nih.gov/pubmed/26917352$$D View this record in MEDLINE/PubMed |
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| Copyright | 2016 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. |
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| Keywords | reduced graphene oxide chemiresistor stretchable soft lithography mogul-patterned substrate double photolithography |
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| Snippet | A mogul‐patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double... A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double... |
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| SubjectTerms | Dimethylpolysiloxanes - chemistry double photolithography Elasticity Electronics Electronics - instrumentation Electronics - methods Fracture mechanics Gold - chemistry Graphene Graphite - chemistry Lithography mogul‐patterned substrate Oxides Photolithography Polymers - chemistry Printing reduced graphene oxide chemiresistor soft lithography stretchable Stretching Substrates |
| Title | Mogul‐Patterned Elastomeric Substrate for Stretchable Electronics |
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