Mogul‐Patterned Elastomeric Substrate for Stretchable Electronics

A mogul‐patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul‐patterned poly(dimethylsiloxane) substrate...

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Bibliographic Details
Published inAdvanced materials (Weinheim) Vol. 28; no. 16; pp. 3069 - 3077
Main Authors Lee, Han‐Byeol, Bae, Chan‐Wool, Duy, Le Thai, Sohn, Il‐Yung, Kim, Do‐Il, Song, You‐Joon, Kim, Youn‐Jea, Lee, Nae‐Eung
Format Journal Article
LanguageEnglish
Published Germany 27.04.2016
Subjects
Dimethylpolysiloxanes - chemistry
double photolithography
Elasticity
Electronics
Electronics - instrumentation
Electronics - methods
Fracture mechanics
Gold - chemistry
Graphene
Graphite - chemistry
Lithography
mogul‐patterned substrate
Oxides
Photolithography
Polymers - chemistry
Printing
reduced graphene oxide chemiresistor
soft lithography
stretchable
Stretching
Substrates
reduced graphene oxide chemiresistor
stretchable
soft lithography
mogul-patterned substrate
double photolithography
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Summary:A mogul‐patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul‐patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul‐patterned stretchable substrate shows great promise for stretchable electronics.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201505218