Droplet dispersion calculations for ultrasonic spray pyrolysis depositions

Spray-CVD is a low cost deposition technique with high efficiency at atmospheric pressure. The thin films quality depends on the deposition parameters: the temperature profile of the substrate, the carrier gas flow rate, the nature of the starting solution, the droplets diameter dispersion, etc.. In...

Full description

Saved in:
Bibliographic Details
Published inJournal of Optoelectronics and Advanced Materials Vol. 9; no. 4; pp. 902 - 906
Main Authors Chapron, D, Girtan, M, Le Pommelec, J-Y, Bouteville, A
Format Journal Article
LanguageEnglish
Published 01.04.2007
Online AccessGet full text

Cover

More Information
Summary:Spray-CVD is a low cost deposition technique with high efficiency at atmospheric pressure. The thin films quality depends on the deposition parameters: the temperature profile of the substrate, the carrier gas flow rate, the nature of the starting solution, the droplets diameter dispersion, etc.. In previous numerical simulation, the optimized carrier gas flow [1] and the temperature profile [2] of our horizontal spray pyrolysis setup have been carried out. The aim of this contribution is to study the correlation of these parameters with injected droplets of the starting solution. The selectivity of the reactor geometry with respect to the droplets diameter dispersion is presented. Then, the optimized deposition parameters calculated by Computational Fluid Dynamics (CFD) simulation for this configuration are demonstrated.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1454-4164