Photochemical patterning of pd with amorphous TiO2 layer and selective electroless deposition of Ni

A novel metal patterning process was developed to reduce the number of chemical processing steps and to obtain 10 mum line width fine patterns. Films of amorphous TiO2 and water-soluble polyvinyl alcohol were used as photocatalytic layers. UV light was directed through a photomask onto the photocata...

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Published inElectrochemical and solid-state letters Vol. 8; no. 2; pp. C36 - C38
Main Authors Noh, Chang-Ho, Kim, Jin-Young, Hwang, Ok-Chae, Cho, Sung-Heon, Song, Ki-Yong, Byk, T V, Sokolov, V G, Gaevskaya, T V, Kim, Jin-Baek
Format Journal Article
LanguageEnglish
Published 01.01.2005
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Summary:A novel metal patterning process was developed to reduce the number of chemical processing steps and to obtain 10 mum line width fine patterns. Films of amorphous TiO2 and water-soluble polyvinyl alcohol were used as photocatalytic layers. UV light was directed through a photomask onto the photocatalytic layers. Pd(II) in an aqueous solution was reduced to Pd(0) by the exposed TiO2 and deposited on the exposed regions. Selective electroless Ni plating on the Pd patterns provided Ni patterns on the TiO2 film. Selective growth of carbon nanotubes on the Ni patterns was carried out by plasma-enhanced chemical vapor deposition.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
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ISSN:1099-0062
DOI:10.1149/1.1848251