Resistance Controllability of Ta2O5/TiO2 Stack ReRAM for Low-Voltage and Multilevel Operation
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Published in | IEEE electron device letters Vol. 31; no. 3; pp. 204 - 206 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
New York, NY
Institute of Electrical and Electronics Engineers
01.03.2010
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Subjects | |
Online Access | Get full text |
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ISSN: | 0741-3106 1558-0563 |
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DOI: | 10.1109/LED.2009.2039021 |