Optical studies of (AsSe)100−xSbx thin films

• Published in: Applied physics. A, Materials science & processing Vol. 104; no. 3; pp. 959 - 962
• Main Authors: Petkova, T., Ilcheva, V., Petkov, E., Petkov, P., Socol, G., Sima, F., Ristoscu, C., Mihailescu, C. N., Mihailescu, I. N., Popov, C., Reithmaier, J. P.
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer-Verlag 01.09.2011
• Subjects: Antimony; Approximation; Characterization and Evaluation of Materials; Condensed Matter Physics; Deposition; Glassy; Machines; Manufacturing; Mathematical analysis; Nanotechnology; Optical and Electronic Materials; Physics; Physics and Astronomy; Processes; Refractive index; Refractivity; Surfaces and Interfaces; Thin Films; Pulse Laser Deposition; Human Resource Development Program; Vacuum Thermal Evaporation; High Optical Quality; Optical Transmission Spectrum
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-011-6461-6

Thin arsenic-selenium-antimony films (AsSe) 100− x Sb x ( x =0,5,10,15 mol.%) have been deposited on glass substrates by vacuum thermal evaporation (VTE) and pulsed laser deposition (PLD) techniques from the corresponding bulk glassy materials. The refractive index and the film thickness have been determined from the optical transmission spectra by modified Swanepoel method. The optical band gap calculated using the Tauc’s approximation showed a narrowing as a function of the increased Sb content from 1.74 eV to 1.53 eV in the VTE films and from 1.64 eV to 1.42 eV in the PLD films. The refractive index of the Sb-doped films strongly increased with the Sb content and reached the largest value for the PLD films. The results verify that both techniques are suitable for deposition of thin glassy films with high optical quality.