Photostabilization : Illuminating photoresist treatment
Photostabilization has played an important role in photoresist treatment and semiconductor processing advancements over the last decade. A 28% increase in implant throughput by one user is one of many examples. With the introduction of deep ultraviolet photoresist in device production, photostabiliz...
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Published in | Semiconductor international Vol. 20; no. 8; pp. 161 - 174 |
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Main Authors | , , , , |
Format | Magazine Article |
Language | English |
Published |
Highlands Ranch, CO
Cahners
01.07.1997
Reed Business Information, a division of Reed Elsevier, Inc |
Subjects | |
Online Access | Get full text |
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Summary: | Photostabilization has played an important role in photoresist treatment and semiconductor processing advancements over the last decade. A 28% increase in implant throughput by one user is one of many examples. With the introduction of deep ultraviolet photoresist in device production, photostabilization's role is now more critical than ever. Looking toward the future, photostabilization tools for processing 300 mm wafers and 0.18 micrometer device production are being developed. Early results from device manufacturers suggest that it may be essential to photostabilize 300 mm wafers to broaden the etch and implant process window for production. |
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ISSN: | 0163-3767 |