X-ray diagnostics of plasma deposited thin layers
Grazing incidence x-ray diffractometry (GIXD) and x-ray reflectometry (XR) have been introduced as well suited tools for investigations of plasma deposited thin layers. They are non-destructive techniques, therefore a sample can be reused and measured with other techniques. A combination of GIXD and...
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| Published in | Vakuum in Forschung und Praxis : Zeitschrift für Vakuumtechnologie, Oberflèachen und Dünne Schichten Vol. 19; no. 4; pp. 24 - 28 |
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| Main Authors | , |
| Format | Journal Article |
| Language | English |
| Published |
01.08.2007
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| Online Access | Get full text |
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| Summary: | Grazing incidence x-ray diffractometry (GIXD) and x-ray reflectometry (XR) have been introduced as well suited tools for investigations of plasma deposited thin layers. They are non-destructive techniques, therefore a sample can be reused and measured with other techniques. A combination of GIXD and XR can give a range of interesting information about chemical, physical and crystallographic properties of thin films. Conclusions can be drawn how plasma deposition techniques and plasma parameters influence the film growth. In three examples we present the analysis of phase and chemical composition, defect structure and measurements of kinetic process parameters. |
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| Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
| ISSN: | 0947-076X 1522-2454 |
| DOI: | 10.1002/vipr.200700324 |