Decreasing Beam Auto Tuning Interruption Events with In-Situ Chemical Cleaning on Axcelis GSD

Ion beam auto tuning time and success rate are often major factors in the utilization and productivity of ion implanters. Tuning software frequently fails to meet specified setup times or recipe parameters, causing production stoppages and requiring manual intervention. Build-up of conductive deposi...

Full description

Saved in:
Bibliographic Details
Published inAIP conference proceedings Vol. 1066; no. 1; pp. 360 - 363
Main Authors Fuchs, Dieter, Spreitzer, Stefan, Vogl, Josef, Bishop, Steve, Eldridge, David, Kaim, Robert
Format Journal Article
LanguageEnglish
Published United States 01.01.2008
Subjects
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
CLEANING
COMPUTER CODES
DEPOSITS
ETCHING
ION BEAMS
ION IMPLANTATION
ION SOURCES
OPTIMIZATION
PRODUCTIVITY
XENON FLUORIDES
Online AccessGet full text

Cover

More Information
Summary:Ion beam auto tuning time and success rate are often major factors in the utilization and productivity of ion implanters. Tuning software frequently fails to meet specified setup times or recipe parameters, causing production stoppages and requiring manual intervention. Build-up of conductive deposits in the arc chamber and extraction gap can be one of the main causes of auto tuning problems. The deposits cause glitching and ion beam instabilities, which lead to errors in the software optimization routines. Infineon Regensburg has been testing use of XeF2, an in-situ chemical cleaning reagent, with positive results in reducing auto tuning interruption events.
Bibliography:SourceType-Scholarly Journals-2
ObjectType-Feature-2
ObjectType-Conference Paper-1
content type line 23
SourceType-Conference Papers & Proceedings-1
ObjectType-Article-3
ISBN:0735405972
9780735405974
ISSN:0094-243X
1551-7616
DOI:10.1063/1.3033636