Effect Of The Plasma Deposition Parameters On The Properties Of Ti/TiN Multilayers For Hard Coatings Applications

In this study, we present the effect of the plasma deposition parameters on the mechanical properties of Ti/TiN multilayers. The elaboration of our films has been carried out by RF-Magnetron Sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The film depositions have be...

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Bibliographic Details
Published inAIP conference proceedings Vol. 1047; no. 1; pp. 256 - 259
Main Authors Saoula, N, Henda, K, Kesri, R
Format Journal Article
LanguageEnglish
Published United States 01.01.2008
Subjects
ARGON
ATOMIC FORCE MICROSCOPY
COATINGS
INTERFACES
LAYERS
MATERIALS SCIENCE
MECHANICAL PROPERTIES
MHZ RANGE
OPTIMIZATION
PLASMA ARC SPRAYING
SPECTROSCOPY
SPUTTERING
STEELS
SUBSTRATES
TITANIUM
TITANIUM NITRIDES
X-RAY DIFFRACTION
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Summary:In this study, we present the effect of the plasma deposition parameters on the mechanical properties of Ti/TiN multilayers. The elaboration of our films has been carried out by RF-Magnetron Sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The film depositions have been done on steel substrates. The first step of our study was the optimization of the depositions conditions in order to obtain good quality films. The amount of nitrogen in the sputtering gases being fixed at 10%. The total pressure was set between 2mTorr to 10mTorr. The deposited multilayers were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), atomic force microscopy (AFM) and micro-indentation.
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ISBN:9780735405752
0735405751
ISSN:0094-243X
1551-7616
DOI:10.1063/1.2999950