Effect Of The Plasma Deposition Parameters On The Properties Of Ti/TiN Multilayers For Hard Coatings Applications
In this study, we present the effect of the plasma deposition parameters on the mechanical properties of Ti/TiN multilayers. The elaboration of our films has been carried out by RF-Magnetron Sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The film depositions have be...
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Published in | AIP conference proceedings Vol. 1047; no. 1; pp. 256 - 259 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
United States
01.01.2008
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Subjects | |
Online Access | Get full text |
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Summary: | In this study, we present the effect of the plasma deposition parameters on the mechanical properties of Ti/TiN multilayers. The elaboration of our films has been carried out by RF-Magnetron Sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The film depositions have been done on steel substrates. The first step of our study was the optimization of the depositions conditions in order to obtain good quality films. The amount of nitrogen in the sputtering gases being fixed at 10%. The total pressure was set between 2mTorr to 10mTorr. The deposited multilayers were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), atomic force microscopy (AFM) and micro-indentation. |
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Bibliography: | SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3 |
ISBN: | 9780735405752 0735405751 |
ISSN: | 0094-243X 1551-7616 |
DOI: | 10.1063/1.2999950 |