Measuring the Ion Flux to the Deposition Substrate in the Hollow Cathode Plasma Jet

• Published in: AIP conference proceedings Vol. 993; no. 1; pp. 427 - 430
• Main Authors: Virostko, P, Hubicka, Z, Cada, M, Adamek, P, Kment, S, Tichy, M, Jastrabik, L
• Format: Journal Article
• Language: English
• Published: United States 01.01.2008
• Subjects: CATIONS; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DEPOSITION; ELECTRIC POTENTIAL; HIGH-FREQUENCY DISCHARGES; HOLLOW CATHODES; KHZ RANGE; MHZ RANGE; PLASMA; PLASMA JETS; SUBSTRATES; THIN FILMS
• ISBN: 9780735405127; 0735405123
• ISSN: 0094-243X; 1551-7616
• DOI: 10.1063/1.2909167

Measurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies. Pulsed DC bi...