Measuring the Ion Flux to the Deposition Substrate in the Hollow Cathode Plasma Jet

Measurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies. Pulsed DC bi...

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Bibliographic Details
Published inAIP conference proceedings Vol. 993; no. 1; pp. 427 - 430
Main Authors Virostko, P, Hubicka, Z, Cada, M, Adamek, P, Kment, S, Tichy, M, Jastrabik, L
Format Journal Article
LanguageEnglish
Published United States 01.01.2008
Subjects
CATIONS
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
DEPOSITION
ELECTRIC POTENTIAL
HIGH-FREQUENCY DISCHARGES
HOLLOW CATHODES
KHZ RANGE
MHZ RANGE
PLASMA
PLASMA JETS
SUBSTRATES
THIN FILMS
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Summary:Measurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies. Pulsed DC bias, middle frequency 500 kHz bias, and 13.56 MHz RF bias were compared. For 13.56 MHz two different methods of ion flux determination were used. These measurements were performed for different bias voltage and discharge conditions.
Bibliography:SourceType-Scholarly Journals-2
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ObjectType-Conference Paper-1
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SourceType-Conference Papers & Proceedings-1
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ISBN:9780735405127
0735405123
ISSN:0094-243X
1551-7616
DOI:10.1063/1.2909167