Modelling of RF Discharge in Argon Plasma

An one-dimensional hybrid model of RF discharge in low-temperature argon plasma is presented in our paper. The hybrid model consists of two parts-particle model which simulates fast electrons while fluid model simulates slow electrons and positive argon ions. In the particle model the positions and...

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Bibliographic Details
Published inAIP conference proceedings Vol. 963; no. 2; pp. 1240 - 1243
Main Authors Jelinek, P, Virostko, P, Hubicka, Z, Bartos, P
Format Journal Article
LanguageEnglish
Published United States 2007
Subjects
ALGORITHMS
ARGON
ARGON IONS
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
COMPUTERIZED SIMULATION
DEPOSITION
ELECTRIC POTENTIAL
ELECTRON COLLISIONS
ELECTRONS
HIGH-FREQUENCY DISCHARGES
PLASMA
PLASMA SIMULATION
STOCHASTIC PROCESSES
SUBSTRATES
THIN FILMS
WAVE FORMS
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Summary:An one-dimensional hybrid model of RF discharge in low-temperature argon plasma is presented in our paper. The hybrid model consists of two parts-particle model which simulates fast electrons while fluid model simulates slow electrons and positive argon ions. In the particle model the positions and velocities of fast electrons are calculated by means of deterministic Verlet algorithm while the collision processes are treated by the stochastic way. For the solution of fluid equations, for slow electrons and positive argon ions, the Scharfetter-Gummel exponential algorithm was used. Typical results of our calculations presented in this paper are total RF current and RF voltage waveforms on the planar substrate immersed into argon plasma. The next results which can be found here are the ion, electron and displacement current waveforms on the substrate. Especially, the knowledge of waveform of the ion current is very important for experimental physicists during the deposition of thin films.
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ISSN:0094-243X
1551-7616
DOI:10.1063/1.2835973