PREPARATION OF ZINC OXIDE FILMS BY AN ELECTROSTATIC SPRAY DEPOSITION PROCESS

Highly transparent ZnO thin films were made by electrostatic spray deposition for 60-120 min at 400 C on soda-lime-silica slide glass substrates. The peaks in the XRD analysis could be indexed as from the structure of crystalline ZnO. From surface observations using FESEM and scanning probe microsco...

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Published inJournal of Ceramic Processing & Research Vol. 7; no. 1; pp. 70 - 74
Main Authors Jeong, J-H, Jeon, Y-S, Jeon, K-O, Hwang, K-S, Kim, B-H
Format Journal Article
LanguageEnglish
Published 세라믹연구소 01.01.2006
Subjects
재료공학
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Summary:Highly transparent ZnO thin films were made by electrostatic spray deposition for 60-120 min at 400 C on soda-lime-silica slide glass substrates. The peaks in the XRD analysis could be indexed as from the structure of crystalline ZnO. From surface observations using FESEM and scanning probe microscopy, the surface morphology of the films was found to depend chiefly on deposition time. All the films exhibited a high transmittance ( > 80%) in the visible region, except for the film deposited for 120 min. The band gap values of the ZnO films deposited for various times were found to be 3.25-3.27 eV. 15 refs.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
G704-001111.2006.7.1.015
ISSN:1229-9162
2672-152X