Mask defect printability and wafer process critical dimension control at 0.25 μm design rules

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Bibliographic Details
Published inJapanese journal of applied physics Vol. 34; no. 12B; pp. 6605 - 6610
Main Authors PEI-YANG YAN, LANGSTON, J, NEFF, J, CHATTERJEE, R
Format Conference Proceeding
LanguageEnglish
Published Tokyo Japanese journal of applied physics 01.12.1995
Subjects
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Microelectronic fabrication
Experimental study
Photolithography
Lithography
Wafer
Dimensional control
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.34.6605