비대칭 바이폴라 펄스 스퍼터법으로 증착된 VN 코팅막의 미세구조, 결정구조 및 기계적 특성에 관한 연구

Nanocrystalline vanadium nitride (VN) coatings were deposited using asymmetric bipolar pulsed dc sputtering to further understand the influence of the pulsed plasmas on the crystal structure, microstructure and mechanical properties. Properties of VN coatings were investigated with FE-SEM, XRD and n...

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Bibliographic Details
Published inBiuletyn Uniejowski Vol. 49; no. 5; pp. 461 - 466
Main Authors 전성용(Sung-Yong Chun), 정평근(Pyeong-Geun Jeong)
Format Journal Article
LanguageKorean
Published 한국표면공학회 2016
Subjects
기계공학
Pulsed Sputtering
VN
Pulse frequency
Duty cycle
Asymmetric Bipolar
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ISSN1225-8024
2299-8403
2288-8403
DOI10.5695/JKISE.2016.49.5.461

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Summary:Nanocrystalline vanadium nitride (VN) coatings were deposited using asymmetric bipolar pulsed dc sputtering to further understand the influence of the pulsed plasmas on the crystal structure, microstructure and mechanical properties. Properties of VN coatings were investigated with FE-SEM, XRD and nanoindentation. The results show that, with the increasing pulse frequency and decreasing duty cycle, the coating morphology changed from a porous columnar to a dense structure, with finer grains. Asymmetric bipolar pulsed dc sputtered VN coatings showed higher hardness, elastic modulus and residual compressive stress than dc sputtered VN coatings. The results suggest that asymmetric bipolar pulsed dc sputtering technique is very beneficial for the reactive sputtering deposition of VN coatings.
Bibliography:KISTI1.1003/JNL.JAKO201632747975485
http://journal.kisehome.or.kr/
G704-000261.2016.49.5.005
ISSN:1225-8024
2299-8403
2288-8403
DOI:10.5695/JKISE.2016.49.5.461