알곤 이온빔 입사각에 따른 Polyethylene Naphthalate 필름 표면의 자가나노구조화 분석

• Published in: Biuletyn Uniejowski Vol. 53; no. 3; pp. 116 - 123
• Main Authors: 조경환(Gyeonghwan Joe), 양준영(Junyeong Yang), 변은연(Eun-Yeon Byeon), 박영배(Young-Bae Park), 정성훈(Sunghoon Jung), 김도근(Do-Geun Kim), 이승훈(Seunghun Lee)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 2020
• Subjects: 기계공학; Masking by oligomer; Ion beam; Polymer; Nanostructure; Quantitative measurement; Self-organized; Surface treatment
• ISSN: 1225-8024; 2299-8403; 2288-8403

Ion beam irradiation induces self-organization of nanostructure on the surface of polymer film. We show that the incident angle of Ar ions on polyethylene naphthalate(PEN) film changes self-organized nanostructure. PEN film was irradiated by argon ion beams with the ion incident angle of 0°, 30°, 45°, 60°, and 80°. Nanostructure was altered from dimple to ripple structure as the angle increases. The ripple structure changed to pillar structure after 60°due to that the shallow incident angle increased the ion energy transfer per depth up to 50 eV/Å, which value could induce excessive surface heating and oligomer formation reacting as a physical mask for anisotropic etching. And quantitative analysis of the nanostructures was adapted by using ABC model and fractal dimension theory.