다양한 기판에 형성된 BDD 전극의 폐수처리 특성

Stability and activity of boron doped diamond (BDD) electrode are key factors for water treatment. In this study, BDD electrodes were prepared on various substrates such as Nb, Si, Ti, and $TiN_x/Ti$ by hot filament chemical vapor deposition (HFCVD) method. BDD/Ti film showed the delamination betwee...

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Bibliographic Details
Published inBiuletyn Uniejowski Vol. 52; no. 2; pp. 53 - 57
Main Authors 권종익(Jong-Ik Kwon), 유미영(Mi-Young You), 김서한(Seo-Han Kim), 송풍근(Pung-Keun Song)
Format Journal Article
LanguageKorean
Published 한국표면공학회 2019
Subjects
기계공학
Boron-doped diamond
TiNx interlayer
Wastewater treatment
Potential window
HF-CVD
TiN_x$ interlayer
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Summary:Stability and activity of boron doped diamond (BDD) electrode are key factors for water treatment. In this study, BDD electrodes were prepared on various substrates such as Nb, Si, Ti, and $TiN_x/Ti$ by hot filament chemical vapor deposition (HFCVD) method. BDD/Ti film showed the delamination between BDD and Ti substrate due to the formation of TiC layer caused by diffusion of carbon. On the other hand, $BDD/TiN_x/Ti$ showed remarkably improved stability, compared to BDD/Ti. It was confirmed that $TiN_x$ intermediate layer act as barrier layer for diffusion of carbon. High potential window of 2.8 eV was maintained on the $BDD/TiN_x/Ti$ electrode and, better wastewater treatment capability and longer electrode working life than BDD/Nb, BDD/Si and BDD/Ti were obtained.
Bibliography:KISTI1.1003/JNL.JAKO201919761177518
ISSN:1225-8024
2299-8403
2288-8403
DOI:10.5695/JKISE.2019.52.2.53