수소 환원 공정과 실리콘 확산 침투 처리 공정을 통한 이규화 몰리브덴 코팅층 형성

• Published in: 대한금속·재료학회지, 50(9) Vol. 50; no. 9; pp. 653 - 657
• Main Authors: 전인목, In Mok Jeon, 변종민, Jong Min Byun, 김세훈, Se Hoon Kim, 김진우, Jin Woo Kim, 김영도, Young Do Kim
• Format: Journal Article
• Language: Korean
• Published: 대한금속재료학회 20.09.2012; 대한금속·재료학회
• Subjects: coating; diffusion; hydrogen reduction; scanning electron microscopy; SEM; thin films; 재료공학
• ISSN: 1738-8228; 2288-8241
• DOI: 10.3365/KJMM.2012.50.9.653

In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750℃ for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 ㎛thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al2O3 : NH4Cl = 5 : 92 : 3 (wt%) packs at 900℃ for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 ㎛thickness was observed.