Highly selective electroreduction of N2 and CO2 to urea over artificial frustrated Lewis pairs

The simultaneous electrocatalytic conversion of N2 and CO2 into value-added urea is highly anticipated but suffers from the predicament of the poor chemisorption, activation, and coupling activity of reactant molecules. Herein, unique frustrated Lewis pairs (FLPs) were precisely designed in flower-l...

Full description

Saved in:
Bibliographic Details
Published inEnergy & environmental science Vol. 14; no. 12; pp. 6605 - 6615
Main Authors Yuan, Menglei, Chen, Junwu, Xu, Yong, Liu, Rongji, Zhao, Tongkun, Zhang, Jingxian, Ren, Zhongyu, Liu, Zhanjun, Streb, Carsten, He, Hongyan, Yang, Chao, Zhang, Suojiang, Zhang, Guangjin
Format Journal Article
LanguageEnglish
Japanese
Published Cambridge Royal Society of Chemistry 01.01.2021
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The simultaneous electrocatalytic conversion of N2 and CO2 into value-added urea is highly anticipated but suffers from the predicament of the poor chemisorption, activation, and coupling activity of reactant molecules. Herein, unique frustrated Lewis pairs (FLPs) were precisely designed in flower-like nickel borate [Ni3(BO3)2], where the surface hydroxyl and neighboring Ni site serve as a Lewis base and acid, respectively. Comprehensive investigations endorsed that the Lewis basic and acidic sites in FLPs acted synergistically in the targeted capture of inert CO2 and N2 by orbital interaction. Subsequently, the bonding and antibonding orbitals of the inert gas interacted with the empty orbitals of the Lewis acid and nonbonding orbitals of the Lewis base, respectively, achieving molecule activation by FLPs. Afterward, the *N=N* and CO intermediates underwent electrocatalytic C–N coupling by the σ orbital carbonylation strategy to produce *NCON* precursors. Thus, the prepared Ni3(BO3)2-150 nanocrystal delivered the record-highest urea yield rate of 9.70 mmol h−1 gcat−1 and a Faradaic efficiency of 20.36% at −0.5 V vs. RHE.
ISSN:1754-5692
1754-5706
DOI:10.1039/d1ee02485j