GaAs etching using Se-molecular beam and hydrogen radical beam
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Published in | Oyo Buturi Vol. 64; no. 2; pp. 155 - 156 |
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Main Authors | , |
Format | Journal Article |
Language | Japanese |
Published |
The Japan Society of Applied Physics
10.02.1995
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Online Access | Get full text |
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ISSN: | 0369-8009 2188-2290 |
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DOI: | 10.11470/oubutsu1932.64.155 |