NO2 Process for Low-Temperature Deposition of SiO2 Films

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Bibliographic Details
Published inOyo Buturi Vol. 37; no. 8; pp. 762 - 765
Main Authors HANEDA, Yuichi, MATSUKURA, Yasuo
Format Journal Article
LanguageEnglish
Japanese
Published The Japan Society of Applied Physics 10.08.1968
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ISSN:0369-8009
2188-2290
DOI:10.11470/oubutsu1932.37.762