Theory and Application of X-Ray Diffraction Micrography

• Published in: Oyo Buturi Vol. 36; no. 2; pp. 88 - 104
• Main Authors: KOHRA, Kazutake, KIKUTA, Seishi
• Format: Journal Article
• Language: English; Japanese
• Published: The Japan Society of Applied Physics 1967
• ISSN: 0369-8009; 2188-2290
• DOI: 10.11470/oubutsu1932.36.88

The principles and characteristics of X-ray diffraction micrography are briefly mentioned compared with electron and optical microscopies. Various effects of diffraction utilized for obtaining the intensity contrast are explained: extinction effect, anomalous absorption, deviation in diffraction peak, satellite or diffuse scattering, anomalous dispersion and interference -between different wave fields. Techniques developed for realizing one-to-one correspondence of the specimen and the diffraction image are reviewed: the use of white or monochromatic X-rays from a point source, the use of monochromatic X-rays from a line source, scanning beam method by movement of the specimen and the double-crystal spectrometer arrangement. Literatures of applications are given for each method above mentioned. Some topics, such as defects in silicon crystals, determination of sign of the Burgers vector, domain structures, Moire patterns, X-ray interferometer and effects of impurities on rocking curves, are mentioned in some details. Dynamical theories on a slightly distorted crystal, studies on the image formation of a dislocation and on the interference fringes due to a strain field or a stacking fault, are reviewed.