Micropatterning of aligning surfaces using photoalignment method

We have fabricated checker patterns with photoalignment method to realize surface aligned nematic bistability. We took the advantage of the rewritability of an azo dye film for simple photomask patterning: UV irradiation of the whole sample followed by photomask patterning with perpendicularly polar...

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Bibliographic Details
Published inProceedings of Japanese Liquid Crystal Society Annual meeting p. 135
Main Authors Niitsuma, Jun-ichi, Mitsuhashi, Yoshinobu, Yoneya, Makoto, Yokoyama, Hiroshi
Format Journal Article
LanguageJapanese
Published THE JAPANESE LIQUID CRYSTAL SOCIETY 2006
Subjects
bistability
micropatterning
photoalignment
surface alignment
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Summary:We have fabricated checker patterns with photoalignment method to realize surface aligned nematic bistability. We took the advantage of the rewritability of an azo dye film for simple photomask patterning: UV irradiation of the whole sample followed by photomask patterning with perpendicularly polarized UV light. The checker patterning with lattice constants of 20-200 microns were achieved.
Bibliography:PA07
ISSN:1880-3490
2432-5988
DOI:10.11538/ekitou.2006.0.135.0