Epitaxial growth of CeO2 films on Si(111) by sputtering
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Published in | Japanese journal of applied physics Vol. 33; no. 1A; pp. 270 - 274 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Tokyo
Japanese journal of applied physics
1994
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Subjects | |
Online Access | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.1143/jjap.33.270 |