On the thickness scaling of ferroelectricity in Al0.78Sc0.22N films

Thickness scaling on ferroelectric properties of sputter-deposited poling-free Al0.78Sc0.22N films has been examined. The c-axis oriented films were confirmed by X-ray rocking curve measurements with a film as thin as 10 nm. Ferroelectric-type hysteresis and poling-free behaviors are observed from t...

Full description

Saved in:
Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 60; no. SB
Main Authors Sung-Lin, Tsai, Hoshii, Takuya, Wakabayashi, Hitoshi, Tsutsui, Kazuo, Tien-Kan, Chung, Edward Yi Chang, Kakushima, Kuniyuki
Format Journal Article
LanguageEnglish
Published Tokyo Japanese Journal of Applied Physics 01.05.2021
Subjects
Deoxidizing
Ferroelectric materials
Ferroelectricity
Thick films
Thickness
Online AccessGet full text

Cover

More Information
Summary:Thickness scaling on ferroelectric properties of sputter-deposited poling-free Al0.78Sc0.22N films has been examined. The c-axis oriented films were confirmed by X-ray rocking curve measurements with a film as thin as 10 nm. Ferroelectric-type hysteresis and poling-free behaviors are observed from the capacitance measurements, even with a thickness of 20 nm. The remnant polarization (P r) shows a gradual degradation when the thickness is less than 35 nm. The switching (SW) cycle test reveals a wake-up effect for the film, especially for thick films of over 35 nm. A longer SW cycle of over 105 times can be obtained with thinner Al0.78Sc0.22N films around 20 nm at the cost of P r.
ISSN:0021-4922
1347-4065
DOI:10.35848/1347-4065/abef15