H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
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Published in | Japanese journal of applied physics Vol. 34; no. 2B; pp. 727 - 731 |
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Main Authors | , , , , , , |
Format | Conference Proceeding |
Language | English |
Published |
Tokyo
Japanese journal of applied physics
1995
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Subjects | |
Online Access | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.1143/JJAP.34.727 |